A 2D analytical electrostatics analysis for the cross-section of a FinFET (or tri-gate MOSFET) is performed to calculate the threshold voltage.
对FinFET器件(或称三栅MOSFET器件)的二维截面做了解析静电学分析以得出阈电压的计算公式。
The analytical solutions to 1D Schrdinger equation (in depth direction) in double gate (DG) MOSFETs are derived to calculate electron density and threshold voltage.
推导了双栅MOSFET器件在深度方向上薛定谔方程的解析解以求得电子密度和阈电压。
Short channel effect of hot electron injection was taken into consideration in the threshold voltage model of submicrometer buried channel pMOSFET,so the model can be used as model for nMOSFET if symbols were changed correspondly.
亚微米埋沟pMOSFET的阈电压模型 ,该模型考虑了热电子发射等短沟道效应 。
